All these observations indicate a rearrangement of the Si nitride network toward that of

the stoichiometric structure with a lower structural disorder. This can be due to a phase separation between Si and Si nitride. Figure 6 Effect of the annealing temperature on the FTIR spectra of SiN x . The FTIR spectra were recorded under normal incidence (a) and with an angle of 65° (b). Raman spectroscopy Figure 7 shows Bindarit clinical trial the evolution of the Raman spectra of SiN x thin layers deposited on fused silica with various Si contents and with various annealing temperatures. Again, it is seen that the evolution of the Raman spectra does not depend on the deposition methods but only on the composition that is set by n. Upon annealing at 900°C, the two broad vibration bands of the transverse acoustic (TA) phonon and of the TO

phonon of a-Si at 150 and 480 cm−1, Dactolisib concentration respectively, became clearly narrower and more pronounced (Figure 7). This evolution can be explained by the formation of small amorphous Si-np [45]. Unlike this deduction, the appearance of new sharp peaks slightly shifted towards lower wavenumbers compared to bulk crystalline Si (c-Si) at approximately 520 cm−1 upon annealing at 1100°C as shown in Figure 7b, which unequivocally demonstrates the formation of small crystalline Si-np. Besides, the formation of a c-Si phase is also consistent with the appearance of a weak peak at 300 cm−1 that is attributed to the second order of the transverse acoustic (2TA) phonon mode in the thin films containing a high Si content (n = 2.89 and 2.98). It is seen Y-27632 cost Ceramide glucosyltransferase that the condensation of the excess of Si in small crystalline Si-np during the annealing at 1100°C occurs but only in thin films having a refractive index higher than 2.5 (Figure 7b) or maybe equal to 2.5 as indicated

by the presence of a weak shoulder (see the arrow) in Figure 7a. Nevertheless, thin films with a low Si content (SiN x > 0.8, see Figure 3) could also contain small Si-np upon annealing at 1100°C but having an amorphous structure. Figure 7 Evolution of the Raman spectra of SiN x with the refractive index and the annealing temperature. Effect of the annealing temperature on the Raman spectra of SiN x thin layers deposited on fused silica with a refractive index below 2.5 (a) and above (b). It independently concerns films produced by the N2-reactive (full symbols) and the co-sputtering (empty symbols) methods. The excitation power density was 0.46 MW/cm2. Figure 8 shows the Raman spectra of the thin films with n > 2.5 (Figure 7b) after annealing at 1100°C. A low excitation energy density of 0.14 MW/cm2 was used to record these spectra in order to avoid any heating and induced stress of the films that may affect the Raman spectra of crystalline Si-np [46]. One can observe that the c-Si peaks progressively shift to higher wavenumbers toward the peak position of bulk c-Si with increasing n.