4 eV. This is different from those of metal Ni0 (852.6 eV) and Ni3+ (856.1 eV) [25, 26] and very

near to that of Ni2+ (855 eV) [21, 25, 27]. This indicates that the chemical valence of Ni in the films is +2. Furthermore, the difference of 17.7 eV between Ni 2p 3/2 and Ni 2p 1/2 peaks also indicates a valence state of +2 for Ni in the Ni-doped TiO2 films [25]. The same analysis also shows a valence state of +2 for Co in Co-doped TiO2 and a valence state of +3 for Fe in Fe-doped TiO2 (in Figure 3). Figure 3 TM 2p core level XPS spectra for Selleck Ruxolitinib TM-doped TiO 2 thin films. High-resolution XPS spectra of Ni 2p (a), Fe 2p (b), and Co 2p (c) core level for TM-doped TiO2 films. Experimental and fitted XPS spectra of Ni 2p (d), Fe 2p (e), and Co 2p (f) core level for Ti0.97TM0.03O2 films. Further, TM doping may also result in oxygen vacancy due to the replacement of Ti4+ by TM ions to maintain crystal charge neutrality, and the vacancy content selleck compound may increase with increasing dopant content. As an example, the O 1 s peaks for TiO2, Ti0.90Co0.01O2, and Ti0.97Co0.03O2 thin films are shown in Figure 4a. Both the O 1 s core levels display an asymmetric shape and are

located at about 530.4 eV. The O 1 s peak was fitted by the two-peak Gaussian curves. The two fitting peaks are defined as OI and OII, respectively (Figure 4b,c,d). The OI peak is Pictilisib molecular weight due to the oxygen atoms of TiO2[24, 28], and the OII peak is attributed to the oxygen vacancies [24, 26, 29]. The OII peak appears as a function of oxygen vacancies. The increase in the area ratio

of OII peak to OI peak indicates the enhancement of oxygen vacancy content [24, 29, 30]. The area ratio is 0.18, 0.28, and 0.32 for TiO2, Ti0.90Co0.01O2, and Ti0.97Co0.03O2 films, respectively. These results indicate that the oxygen vacancies increase with increasing Co content. The same analysis also suggests that oxygen vacancies increase with increasing dopant content for Fe- and Ni-doped TiO2 samples (not shown). Figure 4 Normalized and fitted XPS core level spectra of oxygen 1  s level. Normalized XPS core level spectra of oxygen 1 s level of undoped and Co-doped TiO2 (a). Fitted XPS core level spectra Idoxuridine of oxygen 1 s level of TiO2 film (b), Ti0.99Co0.01O2 film (c), and Ti0.97Co0.03O2 film (d). XRD of the TM-doped TiO2 films The XRD patterns of the TM-doped TiO2 films on silicon substrates are shown in Figure 5. All the films are mixed crystal with diffraction peaks of A(101) and R(110), respectively [20, 21]. Except the diffraction peaks of the anatase and rutile phase, no impurity phase is observed, which indicates that the TM atoms have been successfully incorporated into the TiO2 matrix. The change in the rutile and anatase lattice constant was shown to follow Vegard’s law (Figure 6a,b respectively), in which a linear relation exists between the crystal lattice constant of a material and the concentrations of the constituent elements at constant temperature [31].